Photocatalysis assisting the mechanical polishing of a single-crystal SiC wafer utilizing an anatase TiO2-coated diamond abrasive
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发表刊物:
PRECISION ENGINEERING-JOURNAL OF THE INTERNATIONAL SOCIETIES FOR PRECISION ENGINEERING AND NANOTECHNOLOGY
刊物所在地:
2016JCR大类-工程技术3区
备注:
2018年考核
是否译文:
否
发表时间:
2016-12-07
第一作者:
徐西鹏,陆静