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Associate professor
Supervisor of Master's Candidates

Paper Publications

【一作SCI-二区top】Elucidation of the material removal mechanism of SiC electro-discharge assisted polishing based on conductive polishing pad

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Journal:Wear

Page Number:206831

Translation or Not:no

Date of Publication:2026-09-15

Included Journals:SCI

Next One:【一作SCI-二区top】Study on tribochemical reaction behavior induced by abrasives scratching in SiC wafer backside thinning